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Chemistry Senior High

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Inorganic compounds 27 KCの(6人物 を因した和証 回 硫黄6その化合物 確軸は単体として火山地帯に履区した状態で産出するが。 化合物としても火山ガス, 温泉などの中に開化水素, 二酸化硫 納硫楓かどにも含まれる。また。帝角や石こうなだ角物中にも存在する。太貸の単体には。 常温で安定放 ア | 針状結 品の| イ よび, やや弾力性のか 3種類の同系価が5る。| 9 族除結晶中の太分子は| 工 人の大原子が は 映に結合した分子か5なる。 硫納は化学的にはかなり活発で多種の元素と化合する。 例えば, 確閥を空気中で熱すると。 青白い炎を上げて燃焼し| カ 放生成する。| カ は東泊具のある無色の有導な気体で 実験室では(6)銀に濃台を作用させ たり, (の琶酸水素ナトリウムに希確酸を作用させると得られる。 また, さ5に高温で硫員は由来と下接反応して| キ 上衝生成 る。硫黄の化合物として量要なちのに硫酸があるが, 湿太本は知り気のある包度の大きな液体で 江太酸を旬釈して作5れる 希酸 2 隆が強く 鉄などと反応する引 ク 発生する (③天破琶を確化鉄(と区応させると人水素が発生する (① 文中の空剛|に適する語句または数字を入れよ。 (⑰) 下線部(について, 硫化水素と二酸化硫黄が反応するときの化学反応式を示せ。 3) 黄鉄徹の成分分析をした結果, Fe : 46.5596, S : 53.4596の分析値を得た。黄狭鉱の組成式を求めよ。 (9 下線部6)こ(を化学友応式で表せ。 ekWナトリウム水に有CてにSBたの5。 5計りの7を0え。油人 化学式で答えよ。 硫次の入末を加えて加吉反応させ放置して得5れる無色遂明な拉状の結 を生し, 溶液が白濁した。 こ (群馬大較, 大阪右)

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English Senior High

こちら英語長文問題です。 答えを配布されないため、答えがわかりません。 時間のある方で、解けた方がいたら、答えを教えてくれるととても嬉しいです🥳🙌🙌🙌

ー > o an the Teople say that they never forget as facekbaのselrewidently they do_so me Researchors have howa that he ao iltdgnship beoweerthowpeople hn 中ey wiil do jm studies of face recognition and howrheyrreally-dp。 There 19 SO idence that people who remember faces b2t than り *Hhual memery。 That im. they have s betterthan-ardige abihity_to remember PBB DSPあ。 and HRP GSR They seem to have a special faciHity With _Pickurea and images The ability to recognize and identify people is of fandamenal_importance_in ーー eml magime not ang alle o eggnze awartner ina ond. fahng Jejaes毅品 Your parents sta party or your boss in the office. -The.importance of mermory or aces mest dramatiahiy een in a pesblemremlled yoe9pggesio- Peonle With this problem_canaok recognize ( a ) faces 一even。on occasions。 their 呈 aa mirror。 Surprieingly。 many prosopagnosic patients can relatively_easily-distinguish betoveen other similar objects一cars books and even types of spectacles 一 but not faces. 人 central guestion for psychologyis (-b ) there are special and specifie face- roceswing mechanism diferen hm he:dcntBcation of ther ohjects。 This wohia reqnire identifying and invesiigating Em yeny special and (thankfully) しGA eE People: thoe who have noramal face recognitiom bot poor qbiect recagmition and the cpposite which is ai 中 rcn _meuropsycholagists is whether egp cptiby ae 地at are dedicated to and responsible for face recognition and objecL recognition. Certeinly-ewidene.to date on brain-damaged and non bfatn-damaged patients with prosopagnosia does suggest there are very speifie_bman_regions which 吉 responsible for face processing A two-procss model has been suggested to difierentiate bebyean face amd 0Ajec recognition. One_preeess is called anysis iehidh mee人me proeessing of the bjg pictare: tntal_cnnfiguration。 overall_stracture. "Thisis contrastediwith the こっ組ニー

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Chemistry Senior High

RHEED法の原理と得られる7つの情報が、この英文に書かれているみたいなのですが、よく分かりません。 分かる方助けてください!🙇‍♂️

INTRODUCTION Reection high-energy electron diHiraction (RHEED) uses a Rnely collimated electron beam with energy of 10-100 keV. The beam irradiates a sample surface with gazing incidence to obtain forward scattered difraction patterms. RHEED enables us to analyze structures of crystal surfaces at atomic levels and also to in situ monitor growth processes of thin films (mo、1988: Ichimiya and Cohen、2004: Peng et al.. 2011). From the arrangement。intensity and profile of the dilraction spots in RHEED patterns as described below in detail、 one can obtain various kinds of information: (1) the periodicity (unit cells) in atomic arrangements. (2) flat- ness of surfaces. (3) sizes of grains/domains of surface structures and microcrystals grown on the surface. (3) epitaxial relation between the grown flms/islands with respect to the substrate. (5) parameters character- izing structural phase transitions. (6) individual atomic positions in the unit cells. and (7) growth styles of thin films and numbers of atomic layers grown. The most important advantages of the method are that it is quite easy to install the RHEED apparatus in Yarious types of vacuum chambers without interfering with other components of apparatuses and to do real- time monitoring during thin-Rlm growths. Because of these advantages.RHEED is nowwidelyusednotonlyin research Iabs of surfaces and thin fims. but also in device production processes in industry Low-energy electron diiraction (LEED、see article Low-ENNERcy ErecroN DirscmoN)。 in which an electron beam of 10-100 eV in energy is irradiated onto a sample surface with nearly normal incidence to obtain back- scattered difraction patterns. is also widely used to analyze the atomic structures of crystal surfaces. Since one has to make the sample face directly to the LEED

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